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MG Chemicals # 418-500mL Positive Photo Resist Developer 17oz (Liquid) Online now

$15.16

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SKU: US-16586670100 Categories: ,
Description

Description

MG Chemicals # 418-500mL Positive Photo Resist Developer 17oz (Liquid)

**THIS ITEM MUST BE SHIPPED VIA UPS GROUND**

MG Chemicals # 418-500mL is intended for removing exposed resist during the positive photofabrication process.

Features:

  • Disolves exposed photoresist
  • Concentrated formulation – dilute one part developer to ten parts water
  • For best results, use in conjunction with M.G. Foam Brush (Cat. No. 416-S)
  • Also available in the M.G. Photofabrication Kit (Cat. No. 416-K) .

Shipping & Delivery

We accept returns on non-sale items that are in original packaging, unused, and unwashed within 30 days of receipt. Please follow our returns/exchanges process below. If items do not meet our requirements for return, they will be shipped back to you in lieu of a refund. Shipping and handling charges are non-refundable (exceptions may apply).

Returns & Exchanges Process: If item(s) fit within our returns guidelines found in the Returns. Please allow 7-10 business days for the credit to appear on your account after your return is processed.